Sunday p.m.
Plasma-Surface Interactions
- David Graves, Berkeley, discussion leader
- Joel Kress, Los Alamos National Lab, "Theoretical Studies of Cl/Si Etch Chemistry"
- Joachim Heberlein, U. of Minnesota, "Interactions between a Thermionic Cathode Surface and an Electric Arc"
Monday a.m.
Modelling
- Uwe Kortshagen, University of Minnesota, discussion leader
- Miles Turner, Dublin U., Ireland, "Simulation of Kinetic Effects in RF Discharges"
- Lev Tsendin, St. Petersburg State Technical U., Russia, "Principles of Fast Glow Discharge Modelling"
- Javad Mostaghimi, U. of Toronto, "On a Three-Dimensional Model of Droplet Impact in Plasma Spray Coating Processes"
Monday p.m.
Poster session I: modelling, plasma-surface interactions, fluid dynamics, and particles in plasmas
- Dale Ibbotson, AT&T Bell Labs, discussion leader
Tuesday a.m.
Particles in Plasmas
- Alan Garscadden, Wright Laboratory, discussion leader
- Alan Howling, Ecole Federale de Lausanne, Switzerland, "Initial Clusters in Silane RF Plasmas"
- André Bouchoule, University of Orléans, France, "Low Pressure Plasma Processing of Surfaces and Micropowders for Catalytic Activity"
- Armelle Vardelle, Ecole Nationale Supérieure d'Ingenieurs de Limoges, France, "Transport and Chemical Rate Phenomena in Plasma Sprays"
Tuesday p.m.
Fluid Dynamics in Plasma Processing
Pierre Fauchais, Université de Limoges, France, discussion leader
David Goodwin, Caltech, "Planar Laser-Induced Fluorescence Imaging and Numerical Simulation of Laser-Ablation Plumes"
Steven Vosen, Sandia Livermore, "Modeling of Chemical Downstream Etch Systems"
Wednesday a.m.
Plasma CVD of Superhard Materials
- Emil Pfender, U. of Minnesota, discussion leader
- Mark Cappelli, Stanford, "Diamond and Cubic Boron Nitride Synthesis in Low Density Arcjet Flows"
- Charles Lieber, Harvard, "Fundamental Studies of the Growth and Properties of Carbon Nitride Materials"
- Toyonobu Yoshida, U. of Tokyo, "Vapor phase deposition of cBN: the difference between CVD and PVD"
Wednesday p.m.
Poster session II: materials synthesis, diagnostics, non-equilibrium plasmas in air, and other topics
- Bill Holber, ASTeX Corp., discussion leader
Thursday a.m.
Plasma Spectroscopy
- Gerrit Kroesen, Eindhoven Institute of Technology, Netherlands, discussion leader
- Claude Woods, University of Wisconsin, Madison, "Microwave and Infrared Spectroscopic Diagnostics of High Density Etching and Deposition Plasmas"
- Alix Gicquel, Université Paris-Nord, "Two-Photon Allowed Transition Laser-Induced Fluorescence and Optical Emission Spectroscopy Measurements in a Microwave Plasma Diamond Deposition Reactor."
- K. Tachibana, Kyoto University, "UV to IR Ellipsometry for In Situ Surface Diagnostics in Plasma Processing"
Thursday p.m.
Non-Equilibrium Plasmas in Air
- Mark Kushner, U. of Illinois, discussion leader
- John Lowke, CSIRO, Australia, "Use of Pulsed Electric Corona for Plasma Processing in Air"
- Johannes Conrads, Institut für Niedertemperatur-Plasmaphysik, Greifswald, Germany, "Present Applications and Perspectives for Nonequilibrium Plasmas in Air"
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