| Sunday, August 9 |
| 7:00 p.m. |
Advanced plasma modelling |
| Discussion leader: Dimitris Lymberopoulos (Applied Materials) |
Mark Kushner
(Urbana) |
3-D modelling of processing plasmas |
Tony Murphy
(CSIRO) |
Modelling of transport properties in multicomponent thermal plasmas. |
| Monday, August 10 |
| 8:00 a.m. |
Plasma display technology |
| Discussion leader: Norman Bardsley (USDC) |
Kunihide Tachibana
(Kyoto) |
Diagnostics of AC and DC coupled Plasma Display Panels |
Greg Parker
(LLNL) |
Modelling of plasma activated liquid crystal displays (PALC) |
| 10:30 a.m. |
Dielectric materials processing |
| Discussion leader: Harold Anderson (UNM) |
Gottlieb Oehrlein
(Albany) |
Plasma-surface interaction mechanisms in the HDP etching of dielectric materials |
| 7:00 p.m. |
Poster session I |
| Chair: Javad Mostaghimi (Toronto) |
| Tuesday, August 11 |
| 8:30 a.m. |
Environmental engineering using plasma technology |
| Discussion leader: Sebastien Raoux |
Boris Potapkin
(Moscow) |
Environmental Engineering by atmospheric non-thermal discharges: mechanisms, efficiency, and industrial applications. |
John Lowke
(CSIRO) |
Modelling of non-thermal plasmas to use pulsed corona to destroy NOx and SOx |
Rafael Reif
(MIT) |
Alternative chemistries for PFC's during plasma etching |
| 7:00 p.m. |
Beam experiments for plasma surface interaction studies: assessment of value, perspectives and limitations |
| Discussion leader: David Graves (Berkeley) |
Herb Sawin
(MIT) |
Deconvolving the surface kinetics of plasma etching using beam scattering |
Hideo Sugai
(Nagoya) |
Chemical activity of reactive ions impinging on a surface |
| Wednesday, August 12 |
| 8:30 a.m. |
The role of particles in a-Si:H deposition |
| Discussion leader: Gerrit Kroesen (Eindhoven) |
Pere Roca I Cabarrocas
(Ecole Polytechnique, Paris) |
Incorporation of RF plasma produced Si nanoparticles in a-Si:H films: unexpected perspectives |
Steven Girshick
(Minneapolis) |
Particle nucleation in silane plasmas |
Daniel Morvan
(Paris) |
Plasma spraying of silicon particles for photovoltaic materials |
| 7:00 p.m. |
Poster session II |
| Chair: Marc Capelli |
|
|
| Thursday, August 13 |
| 8:00 a.m. |
Real-time, on-line diagnostics during plasma processing |
| Discussion leader: Pierre Fauchais (Limoges) |
John Baker
(IBM) |
Challenges and Opportunities for RGA Monitoring of Semiconductor Processing Tools |
Jim Fincke
(INEL) |
Diagnostics for Thermal Plasma Processing |
| 10:30 a.m. |
New applications I |
| Discussion leader: Jockel Heberlein (Minneapolis) |
Curt Sieber
(Kodak) |
Plasma surface modification of polyester |
Tadahiro Sakuta
(Kanazawa University) |
New generation of high efficiency, pulse modulated induction thermal plasma for advanced material processing |
|
| 8:00 p.m. |
New applications II |
| Discussion leader: Bill Holber (Astex) |
B. Graham
(Belfast) |
Textile processing |
